学術雑誌発表論文

<1978年度>
  1. K. Murata, M. Kotera and K. Nagami: “Remarks on the Calculation of Energy Loss in Electron-Resist Films on Substrate”, Japanese Journal of Applied Physics, 17, 9, 1671-1672 (1978).
<1981年度>
  1. M. Kotera, K. Murata and K. Nagami: “Monte Carlo Simulation of 1-10keV Electron Scattering in a Gold Target”, Journal of Applied Physics, 52, 12, 997-1003 (1981).
  2. M. Kotera, K. Murata and K. Nagami: “Monte Carlo Simulation of 1-10keV Electron Scattering in a Aluminum Target”, Journal of Applied Physics, 52, 12, 7403-7408 (1981).
<1983年度>
  1. K. Murata, M. Kotera and K. Nagami: “Quantitative Electron Microprobe Analysis of Thin Films on Substrates with a New Monte Carlo Simulation”, Journal of Applied Physics, 54, 2, 1110-1114 (1983).
<1984年度>
  1. M. Kotera D.B. Wittry: “X-ray Fluorescence Analysis with Monochromatic X-rays”, Journal de Physque, 45, 2, C2-281-284 (1984).
  2. M. Kotera D.B. Wittry: “Parameters Influencing Ion intensities for Quadrupole SIMS Instruments”, SIMS IV, Springer Series in Chemical Physics, 36,150-152 (1984).
  3. M. Kotera D.B. Wittry: “Investigation of Gas Phase Ions with a Quadrupole SIMS Instrument”, SIMS IV, Springer Series in Chemical Physics, 36,336-339 (1984).
<1985年度>
  1. K. Murata, M. Kotera, K. Nagami and S. Nambai: “Monte Carlo Modeling of the Photo and Auger Electron Production in X-Ray Lithography with Synchrotron Radiation”, IEEE Transactions on Electron Devices, ED-32, 9, 1694-1703 (1985).
<1986年度>
  1. M. Kotera, K. Murata and K. Nagami: “Monte-Carlo Studies of Energy Straggling of Electrons in Solids”, physica status solidi, (b), 133, 203-209 (1986).
  2. M. Kotera, K. Murata and K. Nagami: “Monte-Carlo Studies of Energy Straggling of Electrons in Solids II. Consideration of Electron Angular Scattering”, physica status solidi, (b), 134, 203-210 (1986).
<1987年度>
  1. 菅 博、小寺正敏、水野隆久: “SOI用電子ビーム整形法”, 電子情報通信学会論文誌C, J70-C, 10, 1449-1451 (1987).
<1988年度>
  1. M. Kotera and H. Suga: “A Simulation of keV Electron Scatterings in a Charged-up Specimen”, Journal of Applied Physics, 63, 15, 261-268 (1988).
<1989年度>
  1. M. Kotera and T. Kishida: “A Monte Carlo Simulation of Secondary Electron Trajectories in a Specimen”, Japanese Journal of Applied Physics, 28, 1, 148-149 (1989).
  2. M. Kotera, T. Kishida and H. Suga: “A Simulation of Secondary Electron Trajectories in Solids”, Scanning Microscopy, 3, 4, 993-1001 (1989).
  3. M. Kotera: “A Monte Carlo simulation of primary and secondary electron trajectories in a specimen”, Journal of Applied Physics, 65, 15, 3991-3998 (1989).
<1990年度>
  1. 小寺正敏: “走査電子顕微鏡像の理論解析”, 表面科学, 11, 9, 535-541 (1990).
  2. M. Kotera, T. Kishida and H. Suga: “Monte Carlo Simulation of Secondary Electrons in Solids and its Application for Scanning Electron Microscopy”, Scanning Microscopy Supplement 4, 111-126 (1990).
  3. M. Kotera, T. Fujiwara, H. Suga and D.B. Wittry: “A Simulation of the Topographic Contrast in the SEM”, Japanese Journal of Applied Physics, 29, 10, 2312-2316 (1990).
  4. M. Kotera, R. Ijichi, T. Fujiwara, H. Suga and D.B. Wittry: “A Simulation of Electron Scattering in Metals”, Japanese Journal of Applied Physics, 29, 10, 2277-2282 (1990).
<1991年度>
  1. M. Kotera, T. Fujiwara, N. Kanai and H. Suga: “Theoretical Evaluation of a Topographic Contrast of Scanning Electron Microscope Images”, Japanese Journal of Applied Physics, 30, 11B, 3287-3293 (1991).
  2. 戸田俊之、来島利幸、小寺正敏、菅 博、“電子軌道が指定された場合の電極設計法”,電子情報通信学会論文誌, C-II, J74-C-II, 12 807-809 (1991).
<1992年度>
  1. M. Kotera, S. Yamaguchi, T. Fujiwara, and H. Suga: “Theoretical Evaluation of a Compositional Contrast of Scanning Electron Microscope Images”, Japanese Journal of Applied Physics, 31, 12B, 4531-4536 (1992).
<1993年度>
  1. M. Kotera, S. Yamaguchi, S. Umegaki and H. Suga: “Simulation of Scanning Electron Microscope Image for Trench Structures”, Japanese Journal of Applied Physics, 32, 12B, 6281-6286 (1993).
  2. M. Kotera, T. Fujiwara, S. Yamaguchi and H. Suga: “Calculation of a Topographic Contrast in the Scanning Electron Microscope”, Scanning Microscopy, 7, 2, 547-554 (1993).
  3. M. Kotera, K. Yamamoto and H. Suga: ”Cross-sections for Electron Scattering Accompanied by Ionization of Inner-shells”, Scanning Microscopy, 7, 4, 1135-1144 (1993).
<1994年度>
  1. M. Kotera, S. Fujiwara, S. Yamaguchi and H. Suga: ”Calculation of a Topographic Contrast in the Scanning Electron Microscope”, Scanning Microscopy, 7, 2, 547-554 (1994).
  2. M. Kotera, K. Yamamoto and H. Suga: “Cross-sections for Electron Scattering Accompanied by Ionization of Inner-shells”, Scanning Microscopy, 7, 4, 1135-1144 (1994).
  3. M. Kotera and Y. Kamitani: “Computer simulation of light emission by high-energy electrons in YAG single crystals”, Ultramicroscopy, 54, 293-300 (1994).
  4. M. Kotera, S. Yamaguchi, S. Umegaki and H. Suga: ”Analysis of Charging Effect During Observation of Trench Structures by Scanning Electron Microscope”, Japanese Journal of Applied Physics, 33, 12B, 7144-7147 (1994).
<1995年度>
  1. T. Kijima, M. Kotera, H. Suga and Y. Nakase: ”Monte Carlo Calculations on the Passage of Electrons through Thin Films Irradiated by 300keV Electrons”, IEICE Transaction on Electronics, E78-C, 557-563 (1995).
  2. 趙 剛, 熊野秀昭, 来島利幸, 小寺正敏, 菅 博: ”空気中試料観測用電子ビーム分析装置の検討”, 電子情報通信学会論文誌, C-II, J78-C-II, 12 589-591 (1995).
  3. M. Kotera, M. Kato and H. Suga: ”Observation Technique of Surface Magnetic Structure Using Type-I Magnetic Contrast in the Scanning Electron Microscope”, Japanese Journal of Applied Physics, 34, 12B, 6903-6906 (1995).
<1996年度>
  1. M. Kotera and K. Tamura: ”Evaluation of the Mott Polarimeter in the Electron Spin Polarization Scanning Electron Microscopy”, Japanese Journal of Applied Physics, 35, 12B, 6614-6619 (1996).
<1997年度>
  1. 田村圭司, 小寺正敏: ”Mott電子スピン偏極検出器の性能解析”, 真空, 40, 3, 173-176 (1997).
  2. 藤田篤広, 小寺正敏, 菅 博: ”Type-I磁気コントラストを用いた磁性体表面の磁区構造解析”, 真空, 40, 3, 190-205 (1997)
  3. 趙 剛, 熊野秀昭, 小寺正敏, 菅 博: ”空気中試料分析装置へのOligo散乱ビームの応用”, 電子情報通信学会論文誌, C-II, J80-C-II, 196-205 (1997).
  4. M. Kotera, K. Yamaguchi, A. Fujita, M. Kato and H. Suga: ”Estimation of the Surface Magnetic Structure of Materials by Scanning Electron Microscopy”, Japanese Journal of Applied Physics, 36, 12B, 7726-7731 (1997).
<1998年度>
  1. M. Kotera and K. Yamaguchi: ”Analysis of the Image Formation Mechanism on High Energy Scanning Electron Microscopy”, Japanese Journal of Applied Physics, 37, 12B, 7024-7027 (1998).
  2. K. Tamura, M. Yasuda, K. Murata and M. Kotera: ”A Simulation of Electron Scattering in Magnetic Materials”, Japanese Journal of Applied Physics, 37, 12B, 7028-7031 (1998).
  3. 小寺正敏,”電子ビーム照射に伴う絶縁物試料の帯電現象のシミュレーション”, 電子顕微鏡, 33, 166-172 (1998).
  4. K. Murata and M. Kotera: “Monte Carlo simulation of electron scattering in solids and its applications to microscopy and microlithography”, Trends in Vacuum Science & Technology, 3, 33-73 (1998).
<1999年度>
  1. 山口 清, 小寺正敏: ”セルプロジェクション方式電子ビームリソグラフィのシミュレータ開発”, 真空, 42, 477 (1999).
  2. 小寺正敏, 山口 清: ”電子ビーム照射に伴う絶縁物帯電のシミュレーション”, 真空, 42, 476 (1999).
  3. 田村圭司, 安田雅昭, 村田顕二, 小寺正敏, 小池和幸: ”Mott検出器の高感度化に関する研究”, 真空, 42, 361-364 (1999).
  4. 小寺正敏, 山口 清, 松岡晃次, 岡川 崇, 小島義則, 山部正樹: ”部分一括露光方式電子ビームリソグラフィシミュレータの開発”, 真空, 42, 764-767 (1999).
  5. M. Kotera, K. Yamaguchi, T. Okagawa, K. Matsuoka, Y. Kojima and M. Yamabe: ”Influence of the mask-scattered electrons in the cell-projection lithography”, Journal of Vacuum Science and Technology, B17, 2921-2926 (1999).
  6. M. Kotera, K. Yamaguchi, T. Okagawa, K. Matsuoka, Y. Kojima and M. Yamabe: ”Characteristic Variation of Exposure Pattern in Cell-Projection Electron-Beam Lithography”, Japanese Journal of Applied Physics, 38, 12B, 7031-7034 (1999).
  7. K. Tamura, M. Yasuda, K. Murata, K. Koike and M. Kotera: ”Analysis of Polarization of Secondary Electrons Emitted from Magnetic Materials”, Japanese Journal of Applied Physics, 38, 12B, 7173-7175 (1999).
  8. M. Kotera, K. Yamaguchi and H. Suga: ”Dynamic Simulation of Electron-Beam-Induced Chargingup of Insulators”, Japanese Journal of Applied Physics, 38, 12B, 7176-7179 (1999).
<2000年度>
  1. 小寺正敏, 山口 清: ”電子ビーム照射に伴う絶縁物帯電のシミュレーション”, 真空, 42, 151-156 (2000).
  2. M. Kotera, K. Yamaguchi, M. Sakai, K. Naruse, T. Okagawa, K. Matsuoka, Y. Kojima and M. Yamabe:”Influence of Electron Acceleration Voltage in the Cell-Projection Lithography System”, MicroElectronic Engineering 53, 353-356 (2000).
  3. M. Kotera, Y. Ishida, K. Naruse, I. Shimizu, Y. Tomo, A. Yoshida, Y. Kojima and M. Yamabe: “An Improved Electron Scattering Simulation at the Mask”,Japanese Journal of Applied Physics, 39, 6861-6868 (2000).
  4. M. Kotera, M. Sakai, I. Shimizu, Y. Tomo, A. Yoshida, Y. Kojima and M. Yamabe: “Influence of Electron Density Distribution at the Electron Source in a Projection Exposure System”,Japanese Journal of Applied Physics, 40, 904-909 (2001)..
<2001年度>
  1. M. Kotera, Y. Ishida, K. Naruse, M. Sakai, Y. Tomo, I. Shimizu, A. Yoshida, Y. Kojima and M. Yamabe: “Influence of the scattered electrons at the mask in a projection lithography system”, MicroElectronic Engineering 57-58, 247-254 (2001).
  2. M. Kotera, M. Sakai, T. Yamada, K. Tamura, Y. Tomo, I. Shimizu, A. Yoshida, Y. Kojima and M. Yamabe: “The influence of the Coulomb interaction effect in the electron beam on the developed resist structure for the projection lithography”, MicroElectronic Engineering 57-58, 255-261 (2001).
  3. K. Tamura, M. Yasuda, M. Kotera and K. Murata:”Performance evaluation of the multi-stage Mott polarimeter using the Monte Carlo simulation”, Review of Scientific Instruments 72, 3921-3926 (2001).
  4. M. Yasuda, K. Tamura, H. Kawata, K. Murata and M. Kotera: ”A Monte Carlo study of spin-polarized electron backscattering from gold thin films”, Nuclear Instruments and Methods in Physics Research B 183, 196-202 (2001).
  5. M. Kotera:”Simulation of time-dependent charging of resist on Si under electron-beam irradiation”, Journal of Vacuum Science and Technology, B19(6), 2516-22519 (2001).
<2002年度>
  1. M. Kotera, T. Yamada and Y. Ishida: “Line Edge Roughness of Developed Resist with Low-Dose Electron Beam Exposure”, Japanese Journal of Applied Physics, 41, 4150-4156 (2002).
<2004年度>
  1. M. Kotera and H. Niu: “Influence of Electron Scattering on Resolution in Low Dose Electron Beam Lithography”, Japanese Journal of Applied Physics, 43, 3749-3754 (2004).
  2. M. Kotera and T. Yukumoto: “Calculation of Coulomb Interaction among Electrons in a High Current Electron Beam Exposure System”, Japanese Journal of Applied Physics, 43, 3744-3748 (2004).
  3. M. Kotera and Y. Ishida:"Mask Charging Phenomena during Electron Beam Exposure in the EPL System", Microscopy and Microanalysis 10, 771-775 (2004).
<2005年度>
  1. M. Kotera and N. Ochiai: “Three-dimensional simulation of resist pattern deformation by surface tension at the drying process”, Microelectronic Engineering 78-79, 515-520 (2005).
  2. M. Kotera, H. Niu, T. Hosokawa and K. Yagura: “Deposited Energy Dependence of Surface Roughness of Polymethylmethacrylate Irradiated by Electron Beam”, Japanese Journal of Applied Physics, 44, 5595-5599 (2005).
  3. M. Kotera, K. Yagura and H. Niu: “Dependence of line width and its edge roughness on electron beam exposure dose”, Journal of Vacuum Science and Technology, B23(6), 2775-2779 (2005).
<2006年度>
  1. 小寺正敏: ”低露光量電子ビームリソグラフィにおけるレジストパタ−ンエッジラフネスへの電子散乱の影響”, 材料, 55, 177-182 (2006).
  2. 小寺正敏: ”電子ビームリソグラフィの精度解析”, 電気学会論文誌C, 126, 683-689 (2006).
<2008年度>
  1. Zulfakri bin Mohamad1, Masumi Shirai, Hayato Sone, Sumio Hosaka and Masatoshi Kotera: “Formation of dot arrays with a pitch of 20 nm × 20 nm for patterned media using 30 keV EB drawing on thin calixarene resist”, 2008 Nanotechnology 19, 025301 (2008).
  2. Masatoshi Kotera, Kei Yagura, Hiroyuki Ttanaka, Daichi Kawano and Takeshi Maekawa; “Extreme Ultraviolet Lithography Simulation by Tracing Photoelectron Trajectories in Resist”, Japanese Journal of Applied Physics, 47 (2008) 4944-4949.
  3. Masaaki Yasuda,a) Yasuaki Kainuma, Hiroaki Kawata and Yoshihiko Hirai, Yasuhiro Tanaka and Rikio Watanabe, Masatoshi Kotera; “Time-dependent charge distributions in polymer films under electron beam irradiation”, Journal of Applied Physics 104 (2008)124904-1 - 124904-5.
<2009年度>
  1. Masatoshi Kotera and Takeshi Maekawa; “Simulation of Fogging Electrons in Electron Beam Lithography”, Japanese Journal of Applied Physics, 48 (2009) 06FB05-1 - 06FB05-4.
  2. Tomotaka Kozuki, Hiroshi Suga, Norio Nawachi, Akira Yamamoto, Takahiro Tsutsumoto and Masatoshi Kotera; “Development of new bio-electron microscope that uses DLC film”, Diamond & Related Materials 18 (2009) 1019-1022.
<2010年度>
  1. Masatoshi Kotera and Yasuhito Akiba; “Analysis of Resist Surface Deformation during Electron Beam Irradiation”, Japanese Journal of Applied Physics, 49 (2010) 06GE08-1 - 06GE08-5.
<2011年度>
  1. Masatoshi Kotera, Akira Osada, Masaru Otani , Yasuhiro Ohara:”Measurement of surface potential of insulating film on a conductive substrate in a scanning electron microscope specimen chamber”, Journal of Vacuum Science and Technology, B 29(6) (2011) 06F316-1 - 06F316-6.
<2016年度>
  1. MMasaaki Yasuda1, Kazuhiro Tada, and Masatoshi Kotera:”Multiphysics Simulation of Nanopatterning in Electron Beam Lithography”, Journal of Photopolymer Science and Technology, 29(5) (2016) 725-730.